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Ion Shower Technology
returned
1
record.
Mathematical modeling of implant dose and characterization of P-N junctions formed by ion shower technology (IST)
.
by
Madrid, Pepe L.
; Diliman, Quezon City: University of the Philippines, 2000.
Subject:
Engineering
;
Material Science -- Semiconductors
;
Electronic industry
;
Ion Shower Technology
;
Dose,Implant
;
Semiconductor devices
.
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